Employee Accomplishments
Employee Accomplishments
- US 06231427 Retaining ring for CMP
- US 06231427 CMP system with fluid bearing support
- US 06231427 Linear polisher for CMP
- US 06159083 Polishing head for CMP
- US 06149512 Linear pad conditioning apparatus
- US 06126527 Seal for polishing belt center support
- US 06086456 CMP hydrostatic fluid bearing support
- US 06062959 CMP hydrostatic fluid bearing support
- US 06042457 Conditioner assembly for CMP process
- US 06000997 Temperature regulation in a CMP process
- US 05980368 Sealed fluid chamber for CMP
- US 05957764 Modular wafer polishing apparatus
- US 05947802 Wafer shuttle system
- US 05935768 Thermal module for photolithography
- US 05803799 Wafer polishing head
- US 05800248 Control of CMP rate across a wafer
- US 05692947 Linear polisher for wafer planarization
- US 05651823 Clustered photolithography system
- US 05593344 Fluid bearings and drive systems for CMP
- US 05575707 Polishing pad cluster for CMP
- US 05571044 Wafer holder for CMP
- US 05558568 CMP with fluid bearings
- US 05553994 Substrate coat/develop system